PDF_Photoacid Generator 1(900KB)
The photoacid generators handled by San-Apro decompose when exposed to light, generating acid. Thermal acid generators decompose when heated, generating acid. Strong basic organic compounds are used in many applications, with their basicity being so strong that they can be used in place of sodium hydroxide. We contribute to the creation of products around the world by making the most of these chemical characteristics.
Thank you for considering our products. We provide support for product development by providing product characteristics, data, and technical information to address the issues faced by product developers and researchers.
We also accept consultations on product development using photoacid generators, thermal acid generators, strong basic organic compounds, and thermal base generators, so please feel free to contact us. Inquiries about samples* are also accepted below.
San-Apro was the first company in the world to successfully industrialize strong basic organic compounds DBU in 1967. We are developing products that meet all kinds of needs, including photo acid generators, thermal base generators, thermal acid generators, and super strong bases.
The “CPI® and IK Series” are triaryl sulfonium salt-type photoacid generators (photo-initiators for cationic polymerization) manufactured using our own proprietary production method. While conventional products contain large amounts of bis-sulfonium salts, the CPI® and IK Series have high purity monosulfonium salts, so they have excellent solubility in organic solvents and matrix resins, and they have excellent one-component storage stability in cationic polymerizable compositions such as epoxy resins
DBU®, DBN There are products that have been given heat latent properties by combining them with various organic acids. Please select the most suitable product according to your intended use.
They are used in thermal cationic curing adhesives and coatings in the fields of electronic materials and optical materials. In addition to being highly active, we are also developing our own original products with even higher functionality.
DBU® and DBN are organic compounds that exhibit extremely strong basicity. They are highly compatible with various solvents and are useful as catalysts for many organic synthesis reactions. They can be used to improve reaction yield and selectivity under milder conditions than those required for conventional tertiary amines or inorganic basic catalysts. They are also used as catalysts for various polymerization and cross-linking reactions.
We provide technical information from San-Apro for technical support and joint research. We will propose solutions to your problems from various angles based on the extensive experience of our engineers.
Photo Acid Generators (PAGs) are substances that generate acid when exposed to light. In this section, we will explain the types of photo acid generators, their reaction mechanisms, and selection criteria.
Thermal Acid Generators (TAG) are substances that generate acid when heated. Here, we will explain the thermal acid generators in our lineup.
DBU is one of the most strongly basic organic compounds. Since the first industrial production of a compound with this structure by San-Apro Ltd. in 1967, it has been favored for its strength as a base, which is strong enough to replace sodium hydroxide, and many researchers have introduced a number of characteristic reactions.
This page contains technical information about photoacid generators, thermal acid generators, super strong bases, and thermal base generators, which are salts of super strong bases, handled by San-Apro.
You can download PDF files of materials distributed at exhibitions held by San-Apro Co., Ltd. PDF Japanese only
In recent years, there has been a worldwide tightening of
regulations on per- and polyfluoroalkyl substances (PFAS), and we
are focusing on the development of PFAS-free products to ensure that
our customers can use them with peace of mind. Please also make use
of our existing lineup of PFAS-free products.
*PFAS: OECD definition published in2021