製品情報
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NA-CS1
Nonionic photoacid generator for i-line.
Since it generates bulky camphorsulfonic acid, it is possible to suppress the diffusivity of the acid (improve the rectangularity of the pattern, etc.).
Excellent resistance to strong amines such as triethylamine and thermal stability.
 | |
| CAS RN® | Non-disclosure |
|---|---|
| M.W. | Approx. 500 |
Physical characteristics / Packing / Development stage
| Appearance | Yellow powder |
|---|---|
| Packing |
0.5kgBottle |
| Stage | Labo |
| Sample | Free：10g |
Q&A
- What is the absorption wavelength?
- The molar extinction coefficient at i-line(365nm) is 400 [M-1 cm-1] .There is no absorption in the h-line(405nm) and g-line (436 nm).
- How soluble is it in solvents.
- It dissolves about 25 wt% in PGMEA and about 35 wt% in γ-butyrolactone.
- What is the resistance to amine compounds?
- It is highly stable even in the presence of pyridine or triethylamine.
- Are there different acid types?
- We have mainly developped alkyl sulfonic acids and aryl sulfonic acids. Please feel free to contact us.
- How much should I add?
-
Add about 0.5 to 3 wt% to the resin, depending on the application and film thickness.
- What film thickness is suitable?
- It has a low molar extinction coefficient at 365 nm and high permeability, making it suitable for use on thick films (50 μm and above).Of course, it can also be used with a thin film.
