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Product Info

Sulfonium Series

CPI®-100 / 200series UV
UV light / i-line
CPI®-300series
i-line
VC-1 VC-2 Series (development product)
i-line
  • VC-1FG(powder)
  • cation
    (light-absorbing site)

    cation(light-absorbing site)
CPI®-400series
g-line / h-line/ i-line
ES-1 (development product)
ES-2 (development product)
g-line / h-line/ i-line
  • ES-1B(powder)
  • ES-2B(powder)
  • cation
    (light-absorbing site)

    cation(light-absorbing site)

Photoacid Generator(Iodonium)
IK Series

  • IK-1(powder)
  • IK-1FG(powder)
  • cation
    (light-absorbing site)

    cation(light-absorbing site)
  • IK-20B(powder)
  • cation
    (light-absorbing site)

    cation(light-absorbing site)

Nonionic Photoacid Generator

NAseries
(development product)
i-line compatible
  • NA-CS1(powder)
  • Aryl amide skeleton with
    a light-absorbing moiety

    Aryl amide skeleton with a light-absorbing moiety

TA Series(Sulfonium Salt Type)

IKseries(Iodonium Salt Type)

AAseries(Ammonium Salt-Type)

 

Thermal Base Generators

DBU Salt Thermal Base Generators

DBU Salt

DBU Salt

DBU derivative Salt

DBU Salt

Phenylphosphine Derivative Salt

Ureas

Amines

Ammonium Salts

NA-CS1Nonionic photoacid generator Photocationic polymerization initiator Arylamide skeleton

Characteristics and Applications

NA-CS1 is a non-ionic type photoacid generator with high sensitivity to i-line, a special grade available only from us. It generates bulky camphorsulfonic acid, making it possible to suppress acid diffusion (e.g., improve pattern rectangularity). It also has excellent resistance to strong amines such as triethylamine and thermal stability.
NA-CS1 is a solvent-free powder product.

NA-CS1 Structure
  • Regarding absorbed wavelengths
    The i-line (365nm) has an absorption of about 400 [M-1cm-1] in molar absorption coefficient.There is no absorption in the h-line (405 nm) or g-line (436 nm).”
  • Solubility
    It dissolves about 25 wt% in PGMEA and about 35 wt% in γ-butyrolactone.
  • Resistance to Amines
    It is highly stable even in the presence of pyridine or triethylamine.
  • Regarding different types of acids generated
    We have mainly developped alkyl sulfonic acids and aryl sulfonic acids. Please feel free to contact us.
  • Recommended amount of additive
    Add about 0.5 to 3 wt% to the resin, depending on the application and film thickness.
  • Recommended film thickness
    It has a low molar extinction coefficient at 365 nm and high permeability, making it suitable for use on thick films (50 μm and above).Of course, it can also be used with a thin film.

Product

NA-CS1

Appearance

粉体

Powder

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Structure Anion CAS RN® M.W. Appearance color High sensivity for i-line Low coloration gh ray high sensitivity High solubility High Activity(Strong acid) Solution product non-PFAS Low corrosiveness Packing Stage
構造式

camphasulfonic acid

Yes (not disclosed) Approx.500 Powder White ~ Light brown 0.5kgBottle Pilot

We also offer technical advice

Thank you for considering our products.
We provide support for product development by offering product characteristics, data and technical information to solve the challenges faced by product developers and researchers.

PFAS FREE

In recent years, there has been a worldwide tightening of regulations on per- and polyfluoroalkyl substances (PFAS), and we are focusing on the development of PFAS-free products to ensure that our customers can use them with peace of mind. Please also make use of our existing lineup of PFAS-free products.

*PFAS: OECD definition published in2021

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