製品情報
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NP-SE10
Nonionic photoacid generator for i-line, h-line, and g-line.
It has excellent solvent solubility and high heat resistance.
It absorbs at higher wavelengths than NP-TM2 and shows a higher acid generation rate.
 | |
| CAS RN® | Non-disclosure |
|---|---|
| M.W. | Approx. 600 |
Physical characteristics / Packing / Development stage
| Appearance | Yellow powder |
|---|---|
| Packing | 0.5kgBottle |
| Stage | Labo |
| Sample | Free：10g |
Q&A
- What is the absorption wavelength?
- The NP-SE10 absorbs i-line (365 nm), h-line(405nm), and g-line(436nm). The molar extinction coefficient at each wavelength are 10,000 [M-1 cm-1] (@365nm), 10,000 [M-1 cm-1](@405nm), and 400 [M-1 cm-1](@436nm).
- How soluble is it in solvents.
- It dissolves about 35 wt% in PGMEA and about 30 wt% in γ-butyrolactone.
- What is the resistance to amine compounds?
- It dissolves about 35 wt% in PGMEA and about 30 wt% in γ-butyrolactone.
- Are there different acid types?
- There is no development record. If you have a desired acid type, please feel free to contact us.
- How much should I add?
-
Add about 0.5 to 3 wt% to the resin, depending on the application and film thickness.
- What film thickness is suitable?
- Suitable for 1 to 50 μm, depending on the exposure wavelength and the type of composition used.
