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Product Info

Photoacid Generator
(Photo-Cationic Polymerization Initiator)

Sulfonium Series

CPI®-100 / 200series UV
UV light / i-line
CPI®-300series
i-line
VC-1 VC-2 Series (development product)
i-line
  • VC-1FG(powder)

  • cation
    (light-absorbing site)

    cation(light-absorbing site)
CPI®-400series
g-line / h-line/ i-line
ES-1 (development product)
ES-2 (development product)
g-line / h-line/ i-line
  • ES-1B(powder)
  • ES-2B(powder)

  • cation
    (light-absorbing site)

    cation(light-absorbing site)

Photoacid Generator(Iodonium)
IK Series

  • IK-1(powder)
  • IK-1FG(powder)

  • cation
    (light-absorbing site)

    cation(light-absorbing site)
  • IK-20B(powder)

  • cation
    (light-absorbing site)

    cation(light-absorbing site)

Nonionic Photoacid Generator

NAseries
(development product)
i-line compatible
  • NA-CS1(powder)

  • Aryl amide skeleton with
    a light-absorbing moiety

    Aryl amide skeleton with a light-absorbing moiety

Thermal acid generator

TA Series(Sulfonium Salt Type)

IKseries(Iodonium Salt Type)

AAseries(Ammonium Salt-Type)

 

Super Strong Base

Thermal Base Generators

DBU Salt Thermal Base Generators

DBU Salt

DBU Salt

DBU derivative Salt

DBU Salt

Phenylphosphine Derivative Salt

Ureas

Amines

Ammonium Salts

Company info

ES-2B Ionic Photoacid Generator, Photo-Cationic Polymerization Initiator (Sulfonium)

Characteristics and Applications

ES-2B is a sulfonium salt type photoacid generator with high sensitivity to i-line, which is a special grade only available from our company, and is even more sensitive to i-line than the CPI-300 series.
The anionic structure is borate, and it exhibits high cationic polymerization. It also has excellent low outgassing during polymerization and low metal corrosion of cured materials.
ES-1B is a solvent-free powder product.

ES-2B Structure
  • Regarding absorbed wavelengths
    In the i-line (365nm), there is an absorption of about 1,200 [M-1cm-1] in terms of molar absorption coefficient, while there is no absorption in the h-line (405nm) and g-line (436nm).
    It is suitable for materials that require high transparency in the visible light range while enhancing photosensitivity to i-line.
  • Characteristics of the generated acid [HB(C6F5)4]
    It has high acid strength and reactivity equivalent to HSbF6. It is also resistant to hydrolysis and does not generate hydrofluoric acid, thus preventing corrosion of surrounding metal parts.
  • Recommended amount of additive
    Depending on the application and film thickness, add about 0.5 to 2 wt% to the resin.

Product

ES-2B

Appearance

粉体

Powder

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Anion CAS RN® M.W. Appearance color High sensivity for i-line Low coloration gh ray high sensitivity High solubility High Activity（Strong acid） Solution product non-PFAS Low corrosiveness Packing Stage

B(C6F5)4

 Yes (not disclosed) Approx. 1400 Powder White〜Yellow ✔ ✔ ✔ ✔ ✔ 0.5kgBottle Pilot

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PFAS FREE

In recent years, there has been a worldwide tightening of regulations on per- and polyfluoroalkyl substances (PFAS), and we are focusing on the development of PFAS-free products to ensure that our customers can use them with peace of mind. Please also make use of our existing lineup of PFAS-free products.

*PFAS: OECD definition published in2021

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