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Product Info

Photoacid Generator
(Photo-Cationic Polymerization Initiator)

Sulfonium Series

CPI®-100 / 200series UV
UV light / i-line
CPI®-300series
i-line
VC-1 VC-2 Series (development product)
i-line
  • VC-1FG(powder)

  • cation
    (light-absorbing site)

    cation(light-absorbing site)
CPI®-400series
g-line / h-line/ i-line
ES-1 (development product)
ES-2 (development product)
g-line / h-line/ i-line
  • ES-1B(powder)
  • ES-2B(powder)

  • cation
    (light-absorbing site)

    cation(light-absorbing site)

Photoacid Generator(Iodonium)
IK Series

  • IK-1(powder)
  • IK-1FG(powder)

  • cation
    (light-absorbing site)

    cation(light-absorbing site)
  • IK-20B(powder)

  • cation
    (light-absorbing site)

    cation(light-absorbing site)

Nonionic Photoacid Generator

NAseries
(development product)
i-line compatible
  • NA-CS1(powder)

  • Aryl amide skeleton with
    a light-absorbing moiety

    Aryl amide skeleton with a light-absorbing moiety

Thermal acid generator

TA Series(Sulfonium Salt Type)

IKseries(Iodonium Salt Type)

AAseries(Ammonium Salt-Type)

 

Super Strong Base

Thermal Base Generators

DBU Salt Thermal Base Generators

DBU Salt

DBU Salt

DBU derivative Salt

DBU Salt

Phenylphosphine Derivative Salt

Ureas

Amines

Ammonium Salts

Company info

Photoacid generatorOverview and Function Map

What is a photoacid genenerator?

A photoacid generator is a compound that generates an acid upon light irradiation, and this acid functions as a catalyst for cationic polymerization, cross-linking reactions, and deprotection reactions. They are particularly used as cationic polymerization initiators for light-curing resins and are utilized in a wide range of applications including paints, coatings, 3D printing resins, adhesives, and negative photoresists.

Overview and Function Map

Overview and Function Map

CPI-100 SeriesGeneral-purpose photoacid generator

The “CPI®-100 Series” is a PFAS FREE products. CPI®-100 Series” is a triarylsulfonium salt type photoacid generator (photocationic polymerization initiator) manufactured by our proprietary process. While conventional products contain large amounts of bis-sulfonium salts, the “CPI®-100 Series” has a high purity of monosulfonium salts, which provides excellent solubility in organic solvents and matrix resins and excellent one-component storage stability in cationic polymerizable compositions such as epoxy resins.

▶CPI-100P/110P
▶CPI-100B(40)/110B
▶CPI-101A

CPI®-200 SeriesOur proprietary high-purity sulfonium salt type photoacid generator

The CPI®-200 series has the same cationic structure as the CPI®-100 series and is our original high-purity sulfonium salt type photoacid generator. Although non-Sb-based, they have the same acid strength and cationic polymerization properties as SbF6 anionic products and excellent solubility in a variety of solvents and monomers; CPI-200K is available as a liquid and CPI-210S as a powder and has excellent storage stability

▶CPI-200K/210S

CPI®-300 SeriesSulfonium salt type photoacid generator with high i-line sensitivity

The CPI®-300 series is an i-line highly sensitive sulfonium salt type photoacid generator that uses a borate anion and has an acid strength equivalent to that of SbF6 anion products, despite being non-Sb based. This modification results in high cationic polymerization, low metal corrosion and low coloration of the cured product.

▶CPI-310B
▶CPI-310FG

VC-1(development product) Sulfonium salt type photoacid generator with high sensitivity to i-line

VC-1(development product) is a grade for transparent applications that suppresses absorption of visible light (g- and h-lines) and has large absorption only for i-rays. Because a special anion is used, the acid strength is equivalent to that of SbF6 anion products even though it is non-Sb-based, and it exhibits high cationic polymerization properties. It also has excellent solubility in a variety of solvents and monomers, including non-polar organic solvents.

▶VC-1 FG

CPI®-400 SeriesSulfonium salt type photoacid generators with high sensitivity to i- and h-rays

CPI®-400 series are sulfonium salt type photoacid generators with high sensitivity to i- and h-rays. CPI-410S and CPI-410B use a special anion and have the same acid strength as SbF6 anion products despite being non-Sb based. This provides high cationic polymerization and excellent solubility, which also contributes to low metal corrosion of the cured material.

▶CPI-410B
▶CPI-410S

ES-1 Series (Developmental product) Sulfonium salt type photoacid generator with high sensitivity to i- and h-rays

The ES-1 series is a sulfonium salt type photoacid generator with high sensitivity to i- and h-rays, and has superior acid generation rate and solubility in organic compounds compared to the CPI-400 series. It uses non-Sb borate anions and has acid strength comparable to SbF6 anion products, providing high cationic polymerization and low metal corrosion of the cured material.

▶ES-1B

ES-2 seriessulfonium salt type photoacid generator with high i-line sensitivity

ES-2 series is a sulfonium salt type photoacid generator with high i-line sensitivity. It uses non-Sb borate anions, has acid strength equivalent to SbF₆ anion products, and exhibits high cationic polymerization and low metal corrosion of cured materials.

▶ES-2B

IK Seriesiodonium salt type photoacid generator

The IK series are a iodine salt type photoacid generators, which can be used in combination with a sensitizer for longer wavelengths. By using a special anion, it has the same acid strength as SbF6 anionic products despite being non-Sb-based, and it also achieves high cationic polymerization and low corrosion. It also features low coloration when heated at high temperatures.

▶IK-1FG
▶IK-1
▶IK-20B

NA Series (Developmental product) Naphthalimide Skeleton

NA-CS1 exhibits high transparency and solubility and is particularly sensitive to i-line.

NA-CS1 exhibits high transparency and solubility and is particularly sensitive to i-line.

▶NA-CS 1

We also offer technical advice

Thank you for considering our products.
We provide support for product development by offering product characteristics, data and technical information to solve the challenges faced by product developers and researchers.

Product Inquiry Technical Consultation Other Consultation/Inquiries
PFAS FREE

In recent years, there has been a worldwide tightening of regulations on per- and polyfluoroalkyl substances (PFAS), and we are focusing on the development of PFAS-free products to ensure that our customers can use them with peace of mind. Please also make use of our existing lineup of PFAS-free products.

*PFAS: OECD definition published in2021

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